Changes in the Resistance to Compression of Resin-modified Glass After Etching with Orthophosphoric Acid

Stefany Gil García

Universidad Cooperativa de Colombia

Sara Mosquera Arenas

Universidad Cooperativa de Colombia

Luz Adriana Hoyos Arias

Universidad Cooperativa de Colombia, sede Pasto

Tatiana Domínguez Jiménez

Universidad Cooperativa de Colombia

Luz Mónica Arango B.

Universidad Cooperativa de Colombia.

Clara Liliana Gallego G.

Universidad Cooperativa de Colombia

Introduction: Resin-modified glass ionomers are materials used as an intermediate base in some dental procedures. Our objective was to evaluate the changes that occur in resistance to compression in a light-cured resin-modified glass ionomer after etching it with 37% orthophosphoric acid.

Materials and methods: We carried out an experimental study in vitro. We prepared forty thermoformed molds. The control group (cg) consisted of 20 samples to which no phosphoric acid was applied and the experimental group (ge) included 20 samples that were etched with 37% orthophosphoric acid for 15 seconds and rinsed with water for 40 seconds. All samples were subjected to a compressive test using an Instron universal testing machine. 10 samples of each group were stored in a water bath. For the analysis we used spss version 19. Tukey and Anova tests were performed.

Results: There were statistically significant differences between the groups with and without acid at 15 minutes with respect to the groups with and without acid at 48 hours. (P = 0.01).

Conclusions: The application of 37% phosphoric acid for 15 seconds does not affect the resistance to compression strength of a lightcured resin-modified glass ionomer. Reduction in resistance to compression might be associated with storing the samples in a wet environment.

Keywords: orthophosphoric acid, intermediate base, resistance to compression, light-cured resin-modified glass ionomer
Published
2013-06-30
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https://plu.mx/plum/a/?doi=10.16925/od.v9i16.12